Saturday, October 17, 2026
ASML High-NA Development Update: Coming to Fabs in 2024 – 2025
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ASML High-NA Development Update: Coming to Fabs in 2024 – 2025

It took the semiconductor industry over a decade to prep everything needed for production of chips using extreme ultraviolet (EUV) lithography. It looks like it is going to take a lot less to reach the next level — EUV with High-NA. Higher Resolution Needed Nowadays the most advanced chips are made on 5/4-nm-class process using EUV lithography ASML's Twinscan…

Critical Zoom vulnerabilities fixed last week required no user interaction
Latest Posts Technology News

Critical Zoom vulnerabilities fixed last week required no user interaction

Enlarge (credit: Zoom) Google's Project Zero vulnerability research team detailed critical vulnerabilities Zoom patched last week making that made it possible for hackers to execute zero-click attacks that remotely ran malicious code on devices running the messaging software. Tracked as CVE-2022-22786 and CVE-2022-22784, the vulnerabilities made it possible to perform attacks even when the victim…